Can I read Generation and Characterization of Polymeric Tridimensional Microstructures for Micromachine Application on EtoBox?

Generation and Characterization of Polymeric Tridimensional Microstructures for Micromachine Application by A.P. Mousinho; R.D. Mansano; A.C.S. de Arruda is a Engineering article available to read on EtoBox.

What is Generation and Characterization of Polymeric Tridimensional Microstructures for Micromachine Application about?

In this work, we use the thick layer of polymethylmethacrylate polymer, for micromachining development. In the development of the structures, a three layer process is used. In a silicon wafer is deposited the thick layer spin coating. Over this layer is deposited a thin layer of silicon. The third layer is 1.5 mm of e-beam resist deposited by spin coating. After the deposition of the layers, we perform the e-beam lithography in the top layer resist. This pattern is transferred by plasma etching for the silicon layer. The resolution limits of this process is the resolution of the electron resist and is increased to 0.25 mm (nanometric resolution), using an electron beam spot size of 50 nm and dry development.

Who reads Generation and Characterization of Polymeric Tridimensional Microstructures for Micromachine Application?

Author

A.P. Mousinho; R.D. Mansano; A.C.S. de Arruda

Publisher

Elsevier Science; Elsevier ; Elsevier Ltd; Elsevier BV (ISSN 0026-2692)

Published

2003

Language

EN

Field

Engineering (Physical Sciences)