About this scholarly article

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Metrology, Inspection, and Process Control for Microlithography XXIII - Tabletop coherent diffractive microscopy with extreme ultraviolet light from high harmonic generation by Raymondson, Daisy A.; Allgair, John A.; Raymond, Christopher J.; Sandberg, Richard L.; Schlotter, William F.; Raines, Kevin S.; La-o-Vorakiat, Chan; Townsend, Ethan; Sakdinawat, Anne; Paul, Ariel; Miao, Jianwei; Murnane, Margaret M.; Kapteyn, Henry C. is a scholarly article available to read on EtoBox.

Author

Raymondson, Daisy A.; Allgair, John A.; Raymond, Christopher J.; Sandberg, Richard L.; Schlotter, William F.; Raines, Kevin S.; La-o-Vorakiat, Chan; Townsend, Ethan; Sakdinawat, Anne; Paul, Ariel; Miao, Jianwei; Murnane, Margaret M.; Kapteyn, Henry C.

Publisher

SPIE

Published

2009