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Surface chemical analysis -- Depth profiling -- Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS by ISO/TC 201/SC 4 Depth profiling is a reference work available to read on EtoBox.

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ISO 16531:2013 specifies methods for the alignment of the ion beam to ensure good depth resolution in sputter depth profiling and optimal cleaning of surfaces when using inert gas ions in Auger electron spectroscopy and X-ray photoelectron spectroscopy. These methods are of two types: one involves a Faraday cup to measure the ion current; the other involves imaging methods. The Faraday cup method also specifies the measurements of current density and current distributions in ion beams. The methods are applicable for ion guns with beams with a spot size below ~1 mm in diameter. The methods do not include depth resolution optimization.

Who reads Surface chemical analysis -- Depth profiling -- Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS?

Author

ISO/TC 201/SC 4 Depth profiling

Publisher

ISO

Published

2013

Language

EN

Category

reference