About this scholarly article

Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468) - Ultra fine multi-line patterning based on sidewall patterning technique by Kyung-Hoon Chung, ; Suk-Kang Sung, ; Jong Duk Lee, ; Byung-Gook Park, is a scholarly article available to read on EtoBox.

Author

Kyung-Hoon Chung, ; Suk-Kang Sung, ; Jong Duk Lee, ; Byung-Gook Park,

Publisher

Japan Soc. Appl. Phys

Published

2001

Language

EN