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About this Engineering article
Investigation of Device Performance and Negative Bias Temperature Instability of Plasma Nitrided Oxide in Nanoscale p-Channel Metal–Oxide–Semiconductor Field-Effect Transistor's by Han, In-Shik; Ji, Hee-Hwan; Goo, Tae-Gyu; Yoo, Ook-Sang; Choi, Won-Ho; Na, Min-Ki; Kim, Yong-Goo; Park, Sung-Hyung; Lee, Heui-Seung; Kang, Young-Seok; Kim, Dae-Byung; Lee, Hi-Deok is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Han, In-Shik; Ji, Hee-Hwan; Goo, Tae-Gyu; Yoo, Ook-Sang; Choi, Won-Ho; Na, Min-Ki; Kim, Yong-Goo; Park, Sung-Hyung; Lee, Heui-Seung; Kang, Young-Seok; Kim, Dae-Byung; Lee, Hi-Deok
- Publisher
- Institute of Pure and Applied Physics; Japan Society of Applied Physics; IOP Publishing (ISSN 0021-4922)
- Published
- 2008
- Language
- EN
- Field
- Engineering (Physical Sciences)