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About this Engineering article
Effect of Reactive-Ion Etching on Thermal Oxide Properties on 4H-SiC by Matocha, Kevin; Cowen, Chris S.; Beaupre, Richard; Tucker, Jesse B. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Matocha, Kevin; Cowen, Chris S.; Beaupre, Richard; Tucker, Jesse B.
- Publisher
- Trans Tech Publications, Ltd.; Trans Tech Publications Ltd. (ISSN 1662-9752)
- Published
- 2006
- Language
- EN
- Field
- Engineering (Physical Sciences)
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