About this scholarly article

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VIII - Kanagawa, Japan (Wednesday 25 April 2001)] Photomask and Next-Generation Lithography Mask Technology VIII - Application of multistep quartz etching method to strong PSMs by Kim, Hyoungdo; Kim, Yong-Hoon; Choi, Seong-Woon; Han, Woo-Sung; Sohn, Jung-Min; Kawahira, Hiroichi is a scholarly article available to read on EtoBox.

Author

Kim, Hyoungdo; Kim, Yong-Hoon; Choi, Seong-Woon; Han, Woo-Sung; Sohn, Jung-Min; Kawahira, Hiroichi

Publisher

SPIE

Published

2001