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About this Materials Science article

The modelling routes for the chemical vapour deposition process: application to Si1−xGex deposition by M. Pons; C. Bernard; H. Rouch; R. Madar is a Materials Science article available to read on EtoBox.

It is typically read by researchers, students, and practitioners in Materials Science.

Author
M. Pons; C. Bernard; H. Rouch; R. Madar
Publisher
Elsevier Science; Elsevier ; Elsevier BV (ISSN 0169-4332)
Published
1995
Field
Materials Science (Physical Sciences)

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