About this Engineering article
Atomic Layer Deposition of High-k Gate Dielectrics Using MO Precursor and Cyclic Plasma Exposure by Endo, Kazuhiko; Tatsumi, Toru is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Endo, Kazuhiko; Tatsumi, Toru
- Publisher
- Cambridge University Press; Cambridge University Press (Materials Research Society); Cambridge University Press (CUP) (ISSN 0272-9172)
- Published
- 2002
- Field
- Engineering (Physical Sciences)