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About this Engineering article
Optimization and Interface Characterization of a Novel Oxide-Free Insulated Gate Structure for InP Having an Ultrathin Silicon Interface Control Layer by Fu, Zhengwen; Takahashi, Hiroshi; Kasai, Seiya; Hasegawa, Hideki is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Fu, Zhengwen; Takahashi, Hiroshi; Kasai, Seiya; Hasegawa, Hideki
- Publisher
- Institute of Pure and Applied Physics; Japan Society of Applied Physics; IOP Publishing (ISSN 0021-4922)
- Published
- 2002
- Field
- Engineering (Physical Sciences)
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