About this scholarly article

SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVIII - Yokohama, Japan (Wednesday 13 April 2011)] Photomask and Next-Generation Lithography Mask Technology XVIII - Role of ellipsometry in DPT process characterization and impact of performance for contact holes by Kamohara, Itaru; Konishi, Toshio; Domnenko, Vitaliy; Philippou, Alexander is a scholarly article available to read on EtoBox.

Author

Kamohara, Itaru; Konishi, Toshio; Domnenko, Vitaliy; Philippou, Alexander

Publisher

SPIE

Published

2011

Language

EN