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Beryllium-based multilayer X-ray optics by Polkovnikov, V N; Salashchenko, N N; Svechnikov, M V; Chkhalo, N I is a Physics and Astronomy article available to read on EtoBox.
What is Beryllium-based multilayer X-ray optics about?
Abstract The article provides a review of the current state of affairs in the field of physics and technology of multilayer beryllium-containing mirrors intended for projection lithography and solar corona studies in the extreme ultraviolet (EUV) region. The methods of synthesizing and studying beryllium-containing multilayer mirrors are described. The results of recent studies on the internal structure and EUV reflection coefficients are given for Mo/Be, Mo/Si, Be/Al, and Be/Mg multilayer mirrors. The effect of Si and Be interlayers on the reflectivity is explained. Avenues for further research on beryllium-containing mirrors are discussed.
Who reads Beryllium-based multilayer X-ray optics?
It is typically read by researchers, students, and practitioners in Physics and Astronomy.
- Author
- Polkovnikov, V N; Salashchenko, N N; Svechnikov, M V; Chkhalo, N I
- Publisher
- Turpion Limited; Uspekhi Fizicheskikh Nauk Journal; Russian Academy of Sciences; Uspekhi Fizicheskikh Nauk (UFN) Journal (ISSN 1063-7869)
- Published
- 2020
- Language
- EN
- Field
- Physics and Astronomy (Physical Sciences)
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