About this scholarly article

1995 Symposium on VLSI Technology. Digest of Technical Papers - Extending gate dielectric scaling limit by use of nitride or oxynitride by Wang, X.W.; Shi, Y.; Ma, T.P.; Cui, G.J.; Tamagawa, T.; Golz, J.W.; Halpen, B.L.; Schmitt, J.J. is a scholarly article available to read on EtoBox.

Author

Wang, X.W.; Shi, Y.; Ma, T.P.; Cui, G.J.; Tamagawa, T.; Golz, J.W.; Halpen, B.L.; Schmitt, J.J.

Publisher

Japan Soc. Appl. Phys

Published

1995

Language

EN