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Variation of the Deposition Rate During Ion Beam Sputter Deposition of Optical Thin Films by Hongxiang Liu; Shengming Xiong; Linghui Li; Yundong Zhang is a Engineering article available to read on EtoBox.

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Time -power monitoring technique was used for monitoring the thickness of optical films during ion beam sputter deposition. For Ta 2 O 5 , in the initial stage of coating, the growth rate increases with deposition time. While for SiO 2 , the rate increases first and then decreases. Both growth rates eventually stabilize when a proper ratio of atoms are sputtered from target materials. Finally, the mismatch of optical thickness and the inhomogeneity of film layers that affect substantially the optical performance of the samples were discussed.

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Author

Hongxiang Liu; Shengming Xiong; Linghui Li; Yundong Zhang

Publisher

Elsevier Science; Elsevier ; Elsevier Sequoia; Elsevier BV (ISSN 0040-6090)

Published

2005

Language

EN

Field

Engineering (Physical Sciences)