About this scholarly article

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - Studying the mechanism of hybrid nanoparticle EUV photoresists by Wallow, Thomas I.; Hohle, Christoph K.; Zhang, Ben; Li, Li; Jiang, Jing; Neisser, Mark; Chun, Jun Sung; Ober, Christopher K.; Giannelis, Emmanuel P. is a scholarly article available to read on EtoBox.

Author

Wallow, Thomas I.; Hohle, Christoph K.; Zhang, Ben; Li, Li; Jiang, Jing; Neisser, Mark; Chun, Jun Sung; Ober, Christopher K.; Giannelis, Emmanuel P.

Publisher

SPIE

Published

2015