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Can I read Chemical deposition and characterization of copper indium diselenide (CISe) thin films on EtoBox?
Chemical deposition and characterization of copper indium diselenide (CISe) thin films by H.M. Pathan; C.D. Lokhande is a Materials Science article available to read on EtoBox.
What is Chemical deposition and characterization of copper indium diselenide (CISe) thin films about?
Copper indium diselenide (CISe) thin films were chemically deposited using modified chemical bath deposition (M-CBD) from solutions of (CuSO 4 + In 2 (SO 4 ) 3 ) and Na 2 SeSO 3 as cationic and anionic sources, respectively. M-CBD is based on the immersion of the substrate into separately placed cationic and anionic precursors. Attempt was made to prepare the CISe films at room temperature. The films were characterized for their structural, morphological, compositional and electrical properties by means of X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), Rutherford back scattering (RBS) and electrical measurement techniques.
Who reads Chemical deposition and characterization of copper indium diselenide (CISe) thin films?
It is typically read by researchers, students, and practitioners in Materials Science.
- Author
- H.M. Pathan; C.D. Lokhande
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0169-4332)
- Published
- 2005
- Language
- EN
- Field
- Materials Science (Physical Sciences)