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About this Materials Science article
Interface Study on Amorphous Indium Gallium Zinc Oxide Thin Film Transistors Using High‐k Gate Dielectric Materials by Lin, Yu Hsien (author);Chou, Jay Chi (author) is a Materials Science article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Materials Science.
- Author
- Lin, Yu Hsien (author);Chou, Jay Chi (author)
- Publisher
- Hindawi Publishing Corporation
- Published
- 2015
- Field
- Materials Science (Physical Sciences)
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