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About this Engineering article
Large Area Exposure in Synchrotron Radiation Lithography Utilizing the Steering of the Electron Beam in the Storage Ring by Tanino, Hiroshi; Hoh, Koichiro; Hirata, Masahiro; Ichimura, Shingo; Atoda, Nobufumi; Tomimasu, Takio; Noguchi, Tsutomu; Sugiyama, Suguru; Yamazaki, Tetsuo is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Tanino, Hiroshi; Hoh, Koichiro; Hirata, Masahiro; Ichimura, Shingo; Atoda, Nobufumi; Tomimasu, Takio; Noguchi, Tsutomu; Sugiyama, Suguru; Yamazaki, Tetsuo
- Publisher
- Institute of Pure and Applied Physics; Japan Society of Applied Physics; IOP Publishing (ISSN 0021-4922)
- Published
- 1983
- Field
- Engineering (Physical Sciences)