About this scholarly article

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Emerging Patterning Technologies - Overview and development of EDA tools for integration of DSA into patterning solutions by Bencher, Christopher; Cheng, Joy Y.; Torres, J. Andres; Fenger, Germain; Khaira, Daman; Ma, Yuansheng; Granik, Yuri; Kapral, Chris; Mitra, Joydeep; Krasnova, Polina; Ait-Ferhat, Dehia is a scholarly article available to read on EtoBox.

Author

Bencher, Christopher; Cheng, Joy Y.; Torres, J. Andres; Fenger, Germain; Khaira, Daman; Ma, Yuansheng; Granik, Yuri; Kapral, Chris; Mitra, Joydeep; Krasnova, Polina; Ait-Ferhat, Dehia

Publisher

SPIE

Published

2017

Language

EN