About this scholarly article

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Advancements in predictive plasma formation modeling by Panning, Eric M.; Goldberg, Kenneth A.; Purvis, Michael A.; Schafgans, Alexander; Brown, Daniel J. W.; Fomenkov, Igor; Rafac, Rob; Brown, Josh; Tao, Yezheng; Rokitski, Slava; Abraham, Mathew; Vargas, Mike; Rich, Spencer; Taylor, Ted; Brandt, David; Pirati, Alberto; Fisher, Aaron; Scott, Howard; Koniges, Alice; Eder, David; Wilks, Scott; Link, Anthony; Langer, Steven is a scholarly article available to read on EtoBox.

Author

Panning, Eric M.; Goldberg, Kenneth A.; Purvis, Michael A.; Schafgans, Alexander; Brown, Daniel J. W.; Fomenkov, Igor; Rafac, Rob; Brown, Josh; Tao, Yezheng; Rokitski, Slava; Abraham, Mathew; Vargas, Mike; Rich, Spencer; Taylor, Ted; Brandt, David; Pirati, Alberto; Fisher, Aaron; Scott, Howard; Koniges, Alice; Eder, David; Wilks, Scott; Link, Anthony; Langer, Steven

Publisher

SPIE

Published

2016

Language

EN