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Can I read Effect of growth parameters on TiO2 thin films deposited using MOCVD on EtoBox?
Effect of growth parameters on TiO2 thin films deposited using MOCVD by Z. Nami; O. Misman; A. Erbil; G.S. May is a Engineering article available to read on EtoBox.
What is Effect of growth parameters on TiO2 thin films deposited using MOCVD about?
The goal of this paper is to characterize the performance of an inverted vertical MOCVD reactor used for the deposition of titanium dioxide thin films. Utilizing two-and three-dimensional numerical simulation to gain a more complete understanding of the fundamental relationships underlying the epitaxial growth process, we develop a model to predict gas velocity, temperature distribution, concentration of reactant gas, and deposition rate. A 3D model is used to explain experimentally observed off-axis deposition of grown films. The model is also used to find the control mechanism for different process conditions. Simulations are compared to experimental results, and excellent agreement is obtained.
Who reads Effect of growth parameters on TiO2 thin films deposited using MOCVD?
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Z. Nami; O. Misman; A. Erbil; G.S. May
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0022-0248)
- Published
- 1997
- Language
- EN
- Field
- Engineering (Physical Sciences)