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The Mechanical Properties of Atomic Layer Deposited Alumina for Use in Micro- and Nano-electromechanical Systems by Marie K. Tripp; Christoph Stampfer; David C. Miller; Thomas Helbling; Cari F. Herrmann; Christofer Hierold; Ken Gall; Steven M. George; Victor M. Bright is a Engineering article available to read on EtoBox.
What is The Mechanical Properties of Atomic Layer Deposited Alumina for Use in Micro- and Nano-electromechanical Systems about?
Mechanical characterization of atomic layer deposited (ALD) alumina (Al 2 O 3 ) for use in micro-and nano-electromechanical systems has been performed using several measurement techniques including: instrumented nanoindentation, bulge testing, pointer rotation, and nanobeam deflection. Using these measurement techniques, we determine Young's modulus, Berkovitch hardness, universal hardness and the intrinsic in-plane stress for ALD Al 2 O 3 . Specifically, measurements for ALD Al 2 O 3 films deposited at 177 • C with thicknesses between 50 and 300 nm are reported. The measured Young's modulus is in the range of 168-182 GPa, Berkovitch hardness is 12.3 GPa, universal hardness is 8 GPa, and the intrinsic in-plane stress is in the range of 383-474 MPa. Multiple measurements of the same material property from different measurement techniques are presented and compared. ALD Al 2 O 3 is an advantageous material to use over various forms of silicon nitride, for micro-and nano-electromechanical systems due in part to the low deposition temperature that allows for integration with CMOS processing. Also, Al 2 O 3 , unlike silicon nitride, has a high chemical resistance to dry-chemistry Si etc
Who reads The Mechanical Properties of Atomic Layer Deposited Alumina for Use in Micro- and Nano-electromechanical Systems?
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Marie K. Tripp; Christoph Stampfer; David C. Miller; Thomas Helbling; Cari F. Herrmann; Christofer Hierold; Ken Gall; Steven M. George; Victor M. Bright
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0924-4247)
- Published
- 2006
- Language
- EN
- Field
- Engineering (Physical Sciences)