About this Engineering article
Dry etching of TaN∕HfO2 gate-stack structure in BCl3∕Ar∕O2 inductively coupled plasmas by Shin, M. H.; Park, M. S.; Lee, N.-E.; Kim, Jiyoung; Kim, Chung Ywong; Ahn, Jinho is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Shin, M. H.; Park, M. S.; Lee, N.-E.; Kim, Jiyoung; Kim, Chung Ywong; Ahn, Jinho
- Publisher
- AVS (American Vacuum Society); American Vacuum Society; American Institute of Physics (ISSN 0734-2101)
- Published
- 2006
- Field
- Engineering (Physical Sciences)