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About this Engineering article
X-Ray Micrographic Observation of Imperfections in Si Wafer near the Oxide Film Edge before and after the Localized Diffusion by Nimura, Hiroshi; Ito, Nobuo; Nakau, Tanehiro; Nakahara, Osamu is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Nimura, Hiroshi; Ito, Nobuo; Nakau, Tanehiro; Nakahara, Osamu
- Publisher
- Institute of Pure and Applied Physics; Japan Society of Applied Physics; IOP Publishing (ISSN 0021-4922)
- Published
- 1968
- Language
- EN
- Field
- Engineering (Physical Sciences)
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